1.ro uf membrane cleaning method
The cleaning method of ro uf membrane is generally determined according to the characteristics of the membrane and the type of treatment liquid. That is, it is cleaned with water power first, and then cleaned with different organic chemical detergents according to the specific situation. For example, electrocoating raw materials can use positive ion-containing solubilizers, and water-soluble organic chemical architectural coatings can use bridging organic solvents. Protein deposition in the food industry can be based on protease organic solvents or polyphosphates and aluminosilicates. The film surface deposition produced by carbonate can be dissolved in many ways by antioxidants such as EDTA or acids and alkalis.
2.ro uf membrane cleaning steps
1. Configure cleaning fluid.
Mix the medicament in a certain ratio for fusion.
2. Low-flow input cleaning fluid.
First, use cleaning Water pump to mix the cleaning liquid, and the flow rate is low when the cleaning liquid is heated. Then use the lowest possible working pressure of the cleaning fluid in exchange for the source water in the component. The working pressure only needs to fully supplement the pressure damage from the seepage to the concentrated water, that is, the working pressure must be so low that it is impossible to cause obvious water seepage. The low-voltage replacement in the actual operation can minimize the re-deposition of stains on the surface of the film. Depending on the situation, part of the concentrated water is discharged to avoid dilution of the cleaning solution.
When the source water is replaced, the cleaning fluid should be present in the concentrated tap water pipeline so that the cleaning fluid can circulate back to the cleaning water storage tank and ensure that the temperature of the cleaning fluid is stable.
Stop the operation of the cleaning pump, so that reverse osmosis membrane cartridge is completely immersed in the cleaning liquid. Sometimes soaking for about 1 hour is enough, but for stubborn contaminants, the soaking time must be increased, such as soaking for 10-15 hours or staying. In order to better maintain the temperature of the entire soaking process, a very low circulation flow rate can be selected.
5. High flow rate for Water pump cycles.
The high flow rate can clean the contaminants cleaned by the cleaning fluid.
The pre-treated qualified water production can be used to clean the cleaning fluid in the system, unless there is a corrosion problem. In order to better avoid deposition, the minimum cleaning temperature is 20°C. In the entire process of acid treatment, the pH value of the cleaning solution should be checked anytime and anywhere. When carbonate deposition consumes acid to dissolve, if the pH rises by more than 0.5 a single low pH, the cleaning tank needs to be filled with acid. The total circulation time of the acid-base cleaning solution should not exceed 20 minutes. After this time, the cleaning solution is likely to be saturated with carbonate after cleaning, and contaminants will accumulate on the membrane surface again.
7. Clean the multi-stage system.
During the cleaning and soaking process of the two systems, all parts of the system can be carried out, but compared with the high-flow circulation system, it must be carried out in stages to ensure that the flow rate of the circulation system is not too low, and the final part is not easy. Too high, this can be done by setting up different cleaning pumps according to each pump cleaning each part or the flow rate of each part.